Rapid sub-diffraction-limit laser micro/nanoprocessing in a threshold material system

Applied Physics Letters

Volumn 80, Issue 2, 2002, Pages 312-314

  Tanaka, Tomokazu ^a   Sun, Hong Bo ^a   Kawata, Satoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION LIMITS; FOCAL SPOT SIZE; LIGHT EXCITATION; MATERIAL SYSTEMS; PROCESSING TIME; PROFILE SCANNING; SDL; SPATIAL RESOLUTION; THRESHOLD BEHAVIOR; THRESHOLD SYSTEMS; TWO PHOTON ABSORPTION;

IMAGE RESOLUTION; MULTIPHOTON PROCESSES; PHOTOPOLYMERIZATION;

DIFFRACTION;

EID: 79955989034     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1432450     Document Type: Article

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