Design and application of high sensitivity two-photon initiators for three-dimensional microfabrication

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 158, Issue 2-3, 2003, Pages 163-170

  Kuebler, Stephen M ^a   Braun, Kevin L ^a   Zhou, Wenhui ^a   Cammack, J Kevin ^a,d   Yu, Tianyue ^b   Ober, Christopher K ^b   Marder, Seth R ^a,c   Perry, Joseph W ^a,c  

^a University of Arizona   (United States)

^b Department of Obstetrics Gynecology   (United States)

^c UNIVERSITY OF ARIZONA   (United States)

^d Biomedical Group   (United States)

Author keywords

Chemically amplified resist; Micro electromechanical structures (MEMS); Microfluidics; Optical micro electromechanical systems (OMEMS); Photoacid generator; Positive tone resist; Three dimensional lithographic microfabrication; Two photon absorption

Indexed keywords

ACID; EPOXIDE;

ARTICLE; CHEMICAL STRUCTURE; CONTROLLED STUDY; EXCITATION; GENERATOR; LASER; LIGHT ABSORPTION; PHOTOCHEMISTRY; PHOTON; POLYMERIZATION; QUANTUM YIELD; RADIOSENSITIVITY; SENSITIVITY ANALYSIS; STRUCTURE ANALYSIS; SYNTHESIS; TECHNIQUE; ULTRAVIOLET RADIATION;

EID: 0037414610     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1010-6030(03)00030-3     Document Type: Article

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