Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures

Optics Letters

Volumn 23, Issue 22, 1998, Pages 1745-1747

  Witzgall, George ^a   Vrijen, Rutger ^a   Yablonovitch, Eli ^a   Doan, Vinh ^a   Schwartz, Benjamin J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000469932     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.23.001745     Document Type: Article

References (7)

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5. E. Yablonovitch and R. Vrijen, "Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure," Opt. Eng. (to be published).
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7. M. Despont, H. Lorenz, N. Fahrni, J. Brugger, P. Renaud, and P. Vettiger, Sensors Actuators A 64, 33 (1998); L. J. Guérin, M. Bossel, M. Demierre, S. Calmes, and Ph. Renaud, in Proceedings of International Solid-State Sensors and Actuators Conference (Transducers '97) (Institute of Electrical and Electronics Engineers, Piscataway, N.J., 1997), p. 1419.