Thickness dependence of the properties of highly c-axis textured AIN thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 361-365

  Martin, F ^a   Muralt, P ^a   Dubois, M A ^b   Pezous, A ^c  

^a EPFL   (Switzerland)

^b CSEM   (Switzerland)

^c UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; COMPRESSION TESTING; CURVE FITTING; DENSITY (SPECIFIC GRAVITY); DEPOSITION; DIELECTRIC LOSSES; ELECTRIC FIELDS; ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; GROWTH (MATERIALS); NUCLEATION; PERMITTIVITY; RESIDUAL STRESSES; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

PIEZOELECTRIC COEFFICIENT; STRAIN DISTRIBUTION;

THIN FILMS;

EID: 1842427341     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1649343     Document Type: Article

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