Effect of gas and cathode material on the r.f. hollow cathode reactive PVD

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 704-708

  Barankova H ^a   Bardos L ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

Al2O3; AlN; PVD; Radio frequency hollow cathode discharge

Indexed keywords

PROCESSING TECHNIQUE; REACTIVE COATING; SPUTTERING;

EID: 0040627706     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00362-X     Document Type: Conference Paper

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