SCOPUS 정보 검색 플랫폼

Volumn 32, Issue 9, 1993, Pages 4052-4056

Ghz-band surface acoustic wave devices using aluminum nitride thin films deposited by electron cyclotron resonance dual ion-beam sputtering

(4) Okano, Hiroshi a Tanaka, Naoki a Shibata, Kenichi a Nakano, Shoichi a

a SANYO ELECTRIC CO LTD (Japan)

Author keywords

AIN; ECR; Film; Filter; SAW; Sputtering; TCD

Indexed keywords

ALUMINA; ALUMINUM COMPOUNDS; CYCLOTRON RESONANCE; ELECTRON RESONANCE; EPITAXIAL GROWTH; FILM GROWTH; ION BEAMS; NITRIDES; SPUTTER DEPOSITION; SUBSTRATES; THIN FILM DEVICES; THIN FILMS;

ALUMINUM NITRIDE; DUAL ION BEAM SPUTTERING; ELECTRON CYCLOTRON RESONANCE;

ACOUSTIC SURFACE WAVE FILTERS;

EID: 0027667941 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.32.4052 Document Type: Article

Times cited : (26)

References (14)

1
- 0022115013
- IEEE Trans. Sonics & Ultra-son
- K. Tsubouchi and N. Mikoshiba: IEEE Trans. Sonics & Ultra-son. SU-32 (1985) 634.
- (1985) SU-32 , pp. 634
- Tsubouchi, K.¹ Mikoshiba, N.²

2
- 0016471623
- F. A. Pizzarello and J. E. Coker: J. Electron. Mater. 4 (1975) 25.
- (1975) J. Electron. Mater , vol.4 , pp. 25
- Pizzarello, F.A.¹ Coker, J.E.²

3
- 84956241719
- IEEE, New York
- K. Sato: Proc. Ultrasonics Symp. (IEEE, New York, 1985) p. 192.
- (1985) Proc. Ultrasonics Symp , pp. 192
- Sato, K.¹

4
- 0018282221
- IEEE, New York
- R. S. Kagiwada, K. H. Yen and K. F. Lau: Proc. 32th Annu. Frequency Control Symp. (IEEE, New York, 1978) p. 598.
- (1978) Proc. 32Th Annu. Frequency Control Symp , pp. 598
- Kagiwada, R.S.¹ Yen, K.H.² Lau, K.F.³

5
- 0001099440
- G. D. O'clock and M. T. Duffy: Appl. Phys. Lett. 23 (1973) 55.
- (1973) Appl. Phys. Lett , vol.23 , pp. 55
- O'clock, G.D.¹ Duffy, M.T.²

6
- 0019298269
- IEEE, New York
- T. Shiosaki, T. Yamamoto, T. Oda, K. Harada and A. Kawabata: Proc. Ultrasonics Symp. (IEEE, New York, 1980) p. 451.
- (1980) Proc. Ultrasonics Symp , pp. 451
- Shiosaki, T.¹ Yamamoto, T.² Oda, T.³ Harada, K.⁴ Kawabata, A.⁵

7
- 0342517473
- L. G. Pearce, R. L. Gunshor and R. F. Pierret: Appl. Phys. Lett. 39 (1981) 878.
- (1981) Appl. Phys. Lett , vol.39 , pp. 878
- Pearce, L.G.¹ Gunshor, R.L.² Pierret, R.F.³

8
- 0020944677
- IEEE, New York
- J. S. Wang, K. M. Lakin and A. R. landin: Proc. 37th Annu. Frequency Control Symp. (IEEE, New York, 1983) p. 144.
- (1983) Proc. 37Th Annu. Frequency Control Symp , pp. 144
- Wang, J.S.¹ Lakin, K.M.² Landin, A.R.³

9
- 84956322660
- IEEE, New York
- L. Xinjiao, X. Zechuan, H. Ziyou, C. Huazhe, S. Wuda, C. Zhong-cai, Z. Feng and S. Li: Proc. 39th Annu. Frequency Control Symp. (IEEE, New York, 1985) p. 144.
- (1985) Proc. 39Th Annu. Frequency Control Symp , pp. 144
- Xinjiao, L.¹ Zechuan, X.² Ziyou, H.³ Huazhe, C.⁴ Wuda, S.⁵ Zhong-Cai, C.⁶ Feng, Z.⁷ Li, S.⁸

10
- 0042151633
- H. Okano, Y. Takahashi, T. Tanaka, K. Shibata and S. Nakano: Jpn. J. Appl. Phys. 31 (1992) 3346.
- (1992) Jpn. J. Appl. Phys , vol.31 , pp. 3346
- Okano, H.¹ Takahashi, Y.² Tanaka, T.³ Shibata, K.⁴ Nakano, S.⁵

11
- 0042151633
- H. Okano, T. Tanaka, K. Shibata and S. Nakano: Jpn. J. Appl. Phys. 31 (1992) 3346.
- (1992) Jpn. J. Appl. Phys , vol.31 , pp. 3346
- Okano, H.¹ Tanaka, T.² Shibata, K.³ Nakano, S.⁴

12
- 0018986587
- C. Weissmantel: J. Vac. Sci. h Technol. 18 (1981) 179.
- (1981) J. Vac. Sci. H Technol. , vol.18 , pp. 179
- Weissmantel, C.¹

13
- 84956322661
- H. Okano, N. Tanaka, T. Tanaka, K. Shibata and S. Nakano: submitted to Jpn. J. Appl. Phys.
- Submitted to Jpn. J. Appl. Phys
- Okano, H.¹ Tanaka, N.² Tanaka, T.³ Shibata, K.⁴ Nakano, S.⁵

14
- 84934707960
- K. M. Taylor and C. Lenie: J. Electrochem. Soc. 107 (1960) 308.
- (1960) J. Electrochem. Soc , vol.107 , pp. 308
- Taylor, K.M.¹ Lenie, C.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.