In situ stress measurements during the growth at different temperatures of Ag-Cu(111) multilayers

Journal of Applied Physics

Volumn 95, Issue 3, 2004, Pages 1152-1161

  Bocquet, F ^a   Bigault, T ^a   Alfonso, C ^a   Labat, S ^a   Thomas, O ^a   Charai, A ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC MODULI; EPITAXIAL GROWTH; GRAIN BOUNDARIES; INTERFACES (MATERIALS); LATTICE CONSTANTS; MICROSTRUCTURE; MORPHOLOGY; MULTILAYERS; STRESS RELAXATION; TENSILE STRESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FILM DEPOSITION; LASER SCANNING; MATTHEWS-BLAKESLEE RELAXATION THEORY; TEMPERATURE-DEPENDENT STRESS;

STRESS ANALYSIS;

EID: 1142281777     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1637140     Document Type: Article

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