Reversible Stress Relaxation during Precoalescence Interruptions of Volmer-Weber Thin Film Growth

Physical Review Letters

Volumn 89, Issue 12, 2002, Pages

  Friesen, C ^a   Thompson, C V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; MONOLAYERS; STRESS RELAXATION; THIN FILMS;

REVERSIBLE STRESS;

POLYCRYSTALLINE MATERIALS;

EID: 0037120411     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.89.126103     Document Type: Article

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