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Volumn 227, Issue 3, 2005, Pages 397-419

A round robin characterisation of the thickness and composition of thin to ultra-thin AlNO films

(25)  Barradas, N P a,b   Added, N c   Arnoldbik, W M d   Bogdanovic Radovic I e   Bohne, W f   Cardoso, S g   Danner, C h   Dytlewski, N i   Freitas, P P g   Jaksic M e   Jeynes, C j   Krug, C k   Lennard, W N l   Lindner, S f   Linsmeier, Ch h   Medunic Z e   Pelicon, P m   Pezzi, R P k   Radtke, C k   Rhrich J f   more..


Author keywords

Ion beam analysis; Oxynitrides; Round robin; Thin films; Tunnel junction barrier

Indexed keywords

ENERGY DISSIPATION; ERROR ANALYSIS; ION BEAMS; MAGNETORESISTANCE; NUCLEAR ENERGY; OXIDATION; QUALITY ASSURANCE; THICKNESS MEASUREMENT; TUNNEL JUNCTIONS;

EID: 10144257232     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.08.021     Document Type: Article
Times cited : (4)

References (61)
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    • Mayer, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.