Interface characterization and thermal stability of Co/Al-O/CoFe spin-dependent tunnel junctions

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 7475-7477

  Lin, Minn Tsong ^a   Ho, C H ^a   Yao, Y D ^b   Huang, R T ^c   Liao, C C ^c   Chen, F R ^c   Kai, J J ^c  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INSTITUTE OF PHYSICS   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; ENERGY DISPERSIVE X-RAY; HIGHER TEMPERATURES; INTERFACE CHARACTERIZATION; INTERFACE PROPERTY; MAGNETIC TUNNEL JUNCTION; OXIDE IONS; SPIN-DEPENDENT TUNNEL JUNCTIONS; SPIN-FLIP SCATTERING; THERMAL-ANNEALING; TUNNEL MAGNETORESISTANCE;

ELECTRIC RESISTANCE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETIC PROPERTIES; MAGNETORESISTANCE; THERMODYNAMIC STABILITY;

ANNEALING;

EID: 0037094521     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1452228     Document Type: Article

References (8)

1. J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey, Phys. Rev. Lett. 74, 3273 (1995). prl PRLTAO 0031-9007
2. M. Jullière, Phys. Lett. A 54, 225 (1975). pya PYLAAG 0375-9601
3. J. C. Slonczewski, Phys. Rev. B 39, 6995 (1989). prb PRBMDO 0163-1829
4. S. S. P. Parkin, K.-S. Moon, K. E. Pettit, D. J. Smith, R. E. Dunin-Borkowski, and M. R. McCartney, Appl. Phys. Lett. 75, 543 (1999). apl APPLAB 0003-6951
5. S. Cardoso, P. P. Freitas, C. de Jesus, P. Wei, and J. C. Soares, Appl. Phys. Lett. 76, 610 (2000). apl APPLAB 0003-6951
6. C. H. Ho, M.-T. Lin, Y. D. Yao, S. F. Lee, Y. Liou, F. R. Chen, J. J. Kai, and C. C. Liao, J. Magn. Soc. Jpn. 25, 210 (2001). jmj NOJGD3 0285-0192
7. C. H. Ho, M.-T. Lin, Y. D. Yao, S. F. Lee, C. C. Liao, F. R. Chen, and J. J. Kai, J. Appl. Phys. 90, 6222 (2001). jap JAPIAU 0021-8979
8. C. C. Liao, C. H. Ho, R. T. Huang, F. R. Chen, J. J. Kai, M.-T. Lin, Y. D. Yao (to be published).