The Si surface yield as a calibration standard for RBS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 161-163, Issue , 2000, Pages 293-296

  Bianconi, M ^a   Abel, F ^b   Banks, J C ^c   Font, A Climent ^d   Cohen, C ^b   Doyle, B L ^c   Lotti, R ^a   Lulli, G ^a   Nipoti, R ^a   Vickridge, I ^b   Walsh, D ^c   Wendler, E ^e  

^a CNR   (Italy)

^b GPS   (France)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^e FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Calibration standards; Rutherford backscattering spectrometry; Silicon; Stopping power

Indexed keywords

AMORPHIZATION; CALIBRATION; HELIUM; ION IMPLANTATION; PARTICLE BEAMS; PARTICLE DETECTORS; SCATTERING; SILICON; SPECTRUM ANALYSIS; SURFACES;

CALIBRATION STANDARD; CHANNELING; HELIUM BEAMS; STOPPING POWER;

RUTHERFORD BACKSCATTERING SPECTROSCOPY;

EID: 17144468110     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00927-1     Document Type: Article

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