RBS, SY-XRF, INAA and ICP-IDMS of antimony implanted in silicon - A multi-method approach to characterize and certify a reference material

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 188, Issue 1-4, 2002, Pages 120-125

  Ecker, K H ^a   Watjen U ^b   Berger, A ^a   Persson, L ^b   Pritzkow, W ^a   Radtke, M ^a   Riesemeier, H ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^b JOINT RESEARCH CENTRE   (Italy)

Author keywords

Certified reference material; ICP IDMS; INAA; RBS; XRF

Indexed keywords

ANTIMONY; FLUORESCENCE; ISOTOPES; MASS SPECTROMETRY; NEUTRON ACTIVATION ANALYSIS; SILICON WAFERS; SYNCHROTRON RADIATION; X RAY ANALYSIS;

REFERENCE MATERIALS;

ION IMPLANTATION;

EID: 0036535436     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)01038-2     Document Type: Conference Paper

References (7)

1. IRMM and BAM information reference materials: Certification of antimony implanted in silicon/silicon dioxide