Wafer level anti-stiction coatings for MEMS

Sensors and Actuators, A: Physical

Volumn 104, Issue 3, 2003, Pages 213-221

  Ashurst, W Robert ^a   Carraro, C ^a   Moboudian, R ^a   Frey, W ^b  

^a University of California   (United States)

^b BOSCH RESEARCH AND TECHNOLOGY CENTER   (United States)

Author keywords

MEMS; Stiction; Vapor processing; Wafer level coating

Indexed keywords

ADHESION; ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; FRICTION; MONOLAYERS; PROTECTIVE COATINGS; SEMICONDUCTING SILICON; SILANES;

ANTI-STICTION COATINGS; CONTACT ANGLE ANALYSIS; DICHLORODIMETHYLSILANE; VAPOR PHASE DEPOSITION; WAFER LEVEL COATING;

MICROELECTROMECHANICAL DEVICES;

EID: 0037568325     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(03)00023-2     Document Type: Article

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