Fabrication of Surface Micromachined Polysilicon Actuators Using Dry Release Process of HF Gas-Phase Etching

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 1996, Pages 761-764

  Lee, Jong Hyun ^a   Chung, Hoi Hwan ^a   Kang, Seung Youl ^a   Baek, Jong Tae ^a   Yoo, Hyung Joun ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GASES; POLYCRYSTALLINE MATERIALS; POLYSILICON; SURFACE MICROMACHINING; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; MASKS; METHANOL; MICROMACHINING; OXIDES; SEMICONDUCTING SILICON; THERMOOXIDATION;

'DRY' [; DETACHMENT LENGTH; ETCHING PROCESS; GAS PHASE ETCHING; MICROGYROSCOPES; POLYSILICON SURFACE-MICROMACHINING; RELEASE PROCESS; SACRIFICIAL OXIDE; SENSITIVE SENSORS;

FABRICATION; ACTUATORS;

DETACHMENT LENGTH; DRY RELEASE PROCESS; GAS PHASE ETCHING; MICROGYROSCOPE STRUCTURES; POLYSICON ACTUATORS; POLYSICON SURFACE MICROMACHINING;

EID: 0030410542     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.1996.554091     Document Type: Conference Paper

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