HF/H2O vapor etching of SiO2 sacrificial layer for large-area surface-micromachined membranes

Sensors and Actuators, A: Physical

Volumn 64, Issue 3, 1998, Pages 247-251

  Anguita, Jose ^a   Briones, Fernando ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

Author keywords

Micromechanics technology; Optical modulator devices; Vapor HF H2O etching

Indexed keywords

CONDENSATION; DRYING; LIGHT MODULATORS; MICROMACHINING; SILICA; SUBSTRATES; VAPORS;

SACRIFICIAL OXIDE ETCHING; VAPOR ETCHING TECHNIQUE;

ETCHING;

EID: 0031674883     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01628-2     Document Type: Article

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