메뉴 건너뛰기




Volumn 43, Issue 3, 2003, Pages 385-398

Integration technology for ferroelectric memory devices

Author keywords

[No Author keywords available]

Indexed keywords

DOPING (ADDITIVES); ELECTRIC POWER SUPPLIES TO APPARATUS; ETCHING; FATIGUE OF MATERIALS; METALLIZING; NONVOLATILE STORAGE; RANDOM ACCESS STORAGE; SMART CARDS;

EID: 0037371695     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(02)00285-8     Document Type: Conference Paper
Times cited : (107)

References (82)
  • 1
    • 0024700094 scopus 로고
    • Ferroelectrics for nonvolatile RAMs
    • Bondurant D., Gnadinger F. Ferroelectrics for nonvolatile RAMs. IEEE Spectrum. 26:1989;30-33.
    • (1989) IEEE Spectrum , vol.26 , pp. 30-33
    • Bondurant, D.1    Gnadinger, F.2
  • 2
    • 35348846979 scopus 로고
    • Ferroelectric memories
    • Scott J., Araujo C. Ferroelectric memories. Science. 246:1989;1400-1405.
    • (1989) Science , vol.246 , pp. 1400-1405
    • Scott, J.1    Araujo, C.2
  • 3
    • 0024089464 scopus 로고
    • An experimental 512-bit non-volatile memory with ferroelectric storage cell
    • Evans J.T., Womack R. An experimental 512-bit non-volatile memory with ferroelectric storage cell. IEEE J. Solid-State Circ. 23:1988;1171.
    • (1988) IEEE J. Solid-State Circ. , vol.23 , pp. 1171
    • Evans, J.T.1    Womack, R.2
  • 4
    • 84956207698 scopus 로고
    • Integration of ferroelectric thin films into nonvolatile memories
    • Sinharoy S., Buhay H., Lampe D.R., Francombe M.H. Integration of ferroelectric thin films into nonvolatile memories. J. Vac. Sci. Technol. A. 10(4):1992;1554-1561.
    • (1992) J. Vac. Sci. Technol. A , vol.10 , Issue.4 , pp. 1554-1561
    • Sinharoy, S.1    Buhay, H.2    Lampe, D.R.3    Francombe, M.H.4
  • 5
    • 0033314228 scopus 로고    scopus 로고
    • Technology prospective for 1T/1C FRAM
    • Kim K.N. Technology prospective for 1T/1C FRAM. Integr. Ferroelectr. 25:1999;149-167.
    • (1999) Integr. Ferroelectr. , vol.25 , pp. 149-167
    • Kim, K.N.1
  • 6
    • 0036117394 scopus 로고    scopus 로고
    • A 0.25 μm 3.0 V 1T1C 32 Mb nonvolatile ferroelectric RAM with address transition detector (ATD) and current forcing latch sense amplifier (CFLSA) scheme
    • Choi MK, Jeon BG, Jang NW, Min BJ, Song YJ, Lee SY, et al. A 0.25 μm 3.0 V 1T1C 32 Mb nonvolatile ferroelectric RAM with address transition detector (ATD) and current forcing latch sense amplifier (CFLSA) scheme. ISSCC digest of technical papers, 2002. p. 162-3.
    • (2002) ISSCC Digest of Technical Papers , pp. 162-163
    • Choi, M.K.1    Jeon, B.G.2    Jang, N.W.3    Min, B.J.4    Song, Y.J.5    Lee, S.Y.6
  • 7
  • 8
    • 0002791793 scopus 로고    scopus 로고
    • High density stand alone-FRAM: Present and future
    • Kim K.N. High density stand alone-FRAM: present and future. Integr. Ferroelectr. 36:2001;21-39.
    • (2001) Integr. Ferroelectr. , vol.36 , pp. 21-39
    • Kim, K.N.1
  • 9
    • 0033281014 scopus 로고    scopus 로고
    • A FRAM technology using 1T1C and triple metal layers for high performance and high density FRAMs
    • Lee SY, Jung DJ, Song YJ, Koo BJ, Park SO, Cho HJ, et al. A FRAM technology using 1T1C and triple metal layers for high performance and high density FRAMs. VLSI Tech Symp, 1999. p. 141.
    • (1999) VLSI Tech Symp , pp. 141
    • Lee, S.Y.1    Jung, D.J.2    Song, Y.J.3    Koo, B.J.4    Park, S.O.5    Cho, H.J.6
  • 13
    • 0013366720 scopus 로고    scopus 로고
    • Press Focus
    • Semiconductor World, Press Focus, 1998;17:85-6.
    • (1998) Semiconductor World , vol.17 , pp. 85-86
  • 16
    • 0033280014 scopus 로고    scopus 로고
    • Fully functional 0.5-μm 64-Kbit embedded SBT FeRAM using a new low temperature SBT deposition technique
    • Eshita T, Nakamura K, Mushiga M, Itho A, Miyagaki S, Yamawaki H, et al. Fully functional 0.5-μm 64-Kbit embedded SBT FeRAM using a new low temperature SBT deposition technique. VLSI Tech Symp, 1999. p. 139-40.
    • (1999) VLSI Tech Symp , pp. 139-140
    • Eshita, T.1    Nakamura, K.2    Mushiga, M.3    Itho, A.4    Miyagaki, S.5    Yamawaki, H.6
  • 17
    • 0033697193 scopus 로고    scopus 로고
    • Mass-productive high performance 0.5 μm embedded FRAM technology with triple layer metal
    • Itoh A, Hikosaka Y, Saito T, Naganuma H, Miyazawa H, Ozaki Y, et al. Mass-productive high performance 0.5 μm embedded FRAM technology with triple layer metal. VLSI Tech Symp, 2000. p. 32-3.
    • (2000) VLSI Tech Symp , pp. 32-33
    • Itoh, A.1    Hikosaka, Y.2    Saito, T.3    Naganuma, H.4    Miyazawa, H.5    Ozaki, Y.6
  • 19
    • 0031632787 scopus 로고    scopus 로고
    • High tolerance operation of 1T/2C FeRAMs for the variation of cell capacitors characteristics
    • Tanabe N, Kobayashi S, Miwa T, Amanuma K, Hoike H, Hada H, et al. High tolerance operation of 1T/2C FeRAMs for the variation of cell capacitors characteristics. VLSI Tech Symp, 1998. 124-5.
    • (1998) VLSI Tech Symp , pp. 124-125
    • Tanabe, N.1    Kobayashi, S.2    Miwa, T.3    Amanuma, K.4    Hoike, H.5    Hada, H.6
  • 20
    • 0001270107 scopus 로고    scopus 로고
    • A 3/3-V, 4 Mb nonvolatile ferroelectric RAM with selectively driven double-pulsed plate read/write-back scheme
    • Chung Y.B., Jeon B.G., Suh K.D. A 3/3-V, 4 Mb nonvolatile ferroelectric RAM with selectively driven double-pulsed plate read/write-back scheme. IEEE J. Solid-State Circ. 35:2000;697-704.
    • (2000) IEEE J. Solid-State Circ. , vol.35 , pp. 697-704
    • Chung, Y.B.1    Jeon, B.G.2    Suh, K.D.3
  • 21
    • 0034316380 scopus 로고    scopus 로고
    • A 0.4 μm 3.3 V 1T1C 4 Mb nonvolatile ferroelectric FRAM with fixed bit-line reference voltage scheme and data protection circuit
    • Jeon B.G., Choi M.K., Oh S.K., Chung Y.B., Suh K.D., Kim K.N. A 0.4 μm 3.3 V 1T1C 4 Mb nonvolatile ferroelectric FRAM with fixed bit-line reference voltage scheme and data protection circuit. IEEE J. Solid-State Circ. 35:2000;1690.
    • (2000) IEEE J. Solid-State Circ. , vol.35 , pp. 1690
    • Jeon, B.G.1    Choi, M.K.2    Oh, S.K.3    Chung, Y.B.4    Suh, K.D.5    Kim, K.N.6
  • 22
    • 0032267113 scopus 로고    scopus 로고
    • FRAM cell design with high immunity to fatigue and imprint for 0.5 μm 3 V 1T1C 1M bit FRAM
    • Tanaka S., Ogiwara R., Itoh Y., Miyakawa T., Takeuchi Y., Doumae S.et al. FRAM cell design with high immunity to fatigue and imprint for 0.5 μm 3 V 1T1C 1M bit FRAM. IEDM Tech. Dig. 1998;359-362.
    • (1998) IEDM Tech. Dig. , pp. 359-362
    • Tanaka, S.1    Ogiwara, R.2    Itoh, Y.3    Miyakawa, T.4    Takeuchi, Y.5    Doumae, S.6
  • 23
    • 0031639822 scopus 로고    scopus 로고
    • A scalable single-transistor/single-capacitor memory cell structure characterized by an angled-capacitor layout for megabit FeRAMs
    • Kachi T, Shoji K, Yamashita H, Kisu T, Torri K, Kumihashi T, et al. A scalable single-transistor/single-capacitor memory cell structure characterized by an angled-capacitor layout for megabit FeRAMs. VLSI Tech Symp, 1998. p. 126-7.
    • (1998) VLSI Tech Symp , pp. 126-127
    • Kachi, T.1    Shoji, K.2    Yamashita, H.3    Kisu, T.4    Torri, K.5    Kumihashi, T.6
  • 24
    • 0035054708 scopus 로고    scopus 로고
    • A nonvolatile ferroelectric RAM with common plate folded bit-line cell and enhanced data sensing scheme
    • Jeon BG, Choi MK, Song YJ, Kim KN. A nonvolatile ferroelectric RAM with common plate folded bit-line cell and enhanced data sensing scheme. ISSCC digest of technical papers, 2001. p. 38-9.
    • (2001) ISSCC Digest of Technical Papers , pp. 38-39
    • Jeon, B.G.1    Choi, M.K.2    Song, Y.J.3    Kim, K.N.4
  • 26
    • 0033554712 scopus 로고    scopus 로고
    • Lanthanum-substituted bismuth titanate for use in non-volatile memories
    • Park B.H., Kang B.S., Bu S.D., Noh T.W., Lee J., Jo W. Lanthanum-substituted bismuth titanate for use in non-volatile memories. Nature. 401:1999;682-684.
    • (1999) Nature , vol.401 , pp. 682-684
    • Park, B.H.1    Kang, B.S.2    Bu, S.D.3    Noh, T.W.4    Lee, J.5    Jo, W.6
  • 28
    • 11744345758 scopus 로고
    • 3 epitaxial thin films on sapphire grown by rf-planar magnetron sputtering
    • 3 epitaxial thin films on sapphire grown by rf-planar magnetron sputtering. J. Appl. Phys. 60:1986;736-741.
    • (1986) J. Appl. Phys. , vol.60 , pp. 736-741
    • Adchi, H.1    Mitsuyu, T.2    Yamazaki, O.3    Wasa, K.4
  • 29
    • 0034453534 scopus 로고    scopus 로고
    • Low thermal-budget fabrication of sputtered-PZT capacitor on multilevel interconnects for embedded FeRAM
    • Inoue N., Naura T., Hayashi Y. Low thermal-budget fabrication of sputtered-PZT capacitor on multilevel interconnects for embedded FeRAM. IEDM Tech. Dig. 2000;797-798.
    • (2000) IEDM Tech. Dig. , pp. 797-798
    • Inoue, N.1    Naura, T.2    Hayashi, Y.3
  • 30
    • 0033333342 scopus 로고    scopus 로고
    • Ferroelectric properties of PLZT thin films prepared using ULVAC EX-1000 sputtering system
    • Chu F., Hickert G., Hadnagy T.D., Suu K.K. Ferroelectric properties of PLZT thin films prepared using ULVAC EX-1000 sputtering system. Integr. Ferroelectr. 26:1999;47.
    • (1999) Integr. Ferroelectr. , vol.26 , pp. 47
    • Chu, F.1    Hickert, G.2    Hadnagy, T.D.3    Suu, K.K.4
  • 33
    • 0035716095 scopus 로고    scopus 로고
    • Highly reliable 1 Mbit ferroelectric memories with newly developed blt thin films and steady integration schemes
    • Yang B., Kang Y.M., Lee S.S., Noh K.H., Kim N.K., Yeom S.J.et al. Highly reliable 1 Mbit ferroelectric memories with newly developed blt thin films and steady integration schemes. IEDM Tech. Dig. 2001;791-792.
    • (2001) IEDM Tech. Dig. , pp. 791-792
    • Yang, B.1    Kang, Y.M.2    Lee, S.S.3    Noh, K.H.4    Kim, N.K.5    Yeom, S.J.6
  • 36
    • 0035455018 scopus 로고    scopus 로고
    • Effect of electrode materials on lead lanthanum zirconate titanate with heating under reduced atmosphere
    • Kondo M., Maruyama K., Kurihara K. Effect of electrode materials on lead lanthanum zirconate titanate with heating under reduced atmosphere. Jpn. J. Appl. Phys. 40:2001;5647-5652.
    • (2001) Jpn. J. Appl. Phys. , vol.40 , pp. 5647-5652
    • Kondo, M.1    Maruyama, K.2    Kurihara, K.3
  • 39
    • 0000585139 scopus 로고    scopus 로고
    • Direct integration of ferroelectric La-Sr-Co-O/Pb-Nb-Zr-Ti-O/La-Sr-Co-O capacitors on silicon with conducting barrier layers
    • Dhote A.M., Madhukar S., Wei W., Venkatesan T., Ramesh R., Cotell C.M. Direct integration of ferroelectric La-Sr-Co-O/Pb-Nb-Zr-Ti-O/La-Sr-Co-O capacitors on silicon with conducting barrier layers. Appl. Phys. Lett. 68:1996;1350-1352.
    • (1996) Appl. Phys. Lett. , vol.68 , pp. 1350-1352
    • Dhote, A.M.1    Madhukar, S.2    Wei, W.3    Venkatesan, T.4    Ramesh, R.5    Cotell, C.M.6
  • 41
    • 0031145560 scopus 로고    scopus 로고
    • Etching effects on ferroelectric capacitors with multilayered electrodes
    • Chung C.W., Kim C.J. Etching effects on ferroelectric capacitors with multilayered electrodes. Jpn. J. Appl. Phys. 36:1997;2747-2753.
    • (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 2747-2753
    • Chung, C.W.1    Kim, C.J.2
  • 48
    • 0001205175 scopus 로고    scopus 로고
    • 3 on a Pt electrode
    • 3 on a Pt electrode. Appl. Phys. Lett. 73:1998;1955-1957.
    • (1998) Appl. Phys. Lett. , vol.73 , pp. 1955-1957
    • Ikarashi, N.1
  • 56
    • 0031192945 scopus 로고    scopus 로고
    • Thermal stability of Ir/polycrystalline-Si structure for bottom electrode of integrated ferroelectric capacitors
    • Jeon Y., Seon J., Joo J., Oh K., Roh J., Kim J.et al. Thermal stability of Ir/polycrystalline-Si structure for bottom electrode of integrated ferroelectric capacitors. Appl. Phys. Lett. 71:1997;467-469.
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 467-469
    • Jeon, Y.1    Seon, J.2    Joo, J.3    Oh, K.4    Roh, J.5    Kim, J.6
  • 57
    • 0000388685 scopus 로고    scopus 로고
    • Integration and electrical properties of diffusion barrier for high density ferroelectric memory
    • Song Y.J., Kim H.H., Lee S.Y., Jung D.J., Koo B.J., Lee J.K.et al. Integration and electrical properties of diffusion barrier for high density ferroelectric memory. Appl. Phys. Lett. 76:1999;451-453.
    • (1999) Appl. Phys. Lett. , vol.76 , pp. 451-453
    • Song, Y.J.1    Kim, H.H.2    Lee, S.Y.3    Jung, D.J.4    Koo, B.J.5    Lee, J.K.6
  • 58
    • 79956051864 scopus 로고    scopus 로고
    • Electrical properties of highly reliable plug buffer layer for high-density ferroelectric memory
    • Song Y.J., Koo B.J., Lee J.K., Kim C.J., Jang N.W., Kim H.H.et al. Electrical properties of highly reliable plug buffer layer for high-density ferroelectric memory. Appl. Phys. Lett. 80:2002;2377-2379.
    • (2002) Appl. Phys. Lett. , vol.80 , pp. 2377-2379
    • Song, Y.J.1    Koo, B.J.2    Lee, J.K.3    Kim, C.J.4    Jang, N.W.5    Kim, H.H.6
  • 59
    • 0013363473 scopus 로고    scopus 로고
    • The origin and elimination of random single-bit failure in high density 1T1C FRAM
    • Kim H.H., Jung D.J., Lee S.Y., Song Y.J., Jang N.W., Lee J.K.et al. The origin and elimination of random single-bit failure in high density 1T1C FRAM. Integr. Ferroelectr. 39:2001;239-248.
    • (2001) Integr. Ferroelectr. , vol.39 , pp. 239-248
    • Kim, H.H.1    Jung, D.J.2    Lee, S.Y.3    Song, Y.J.4    Jang, N.W.5    Lee, J.K.6
  • 60
    • 0013455792 scopus 로고    scopus 로고
    • Effects of ILD&IMD characteristics on ferroelectric properties of FRAM devices
    • Lee Y.T., Lee K.M., AN H.G., Joo S.H., Nam S.D., Lee S.W. Effects of ILD&IMD characteristics on ferroelectric properties of FRAM devices. Integr. Ferroelectr. 39:2001;3-11.
    • (2001) Integr. Ferroelectr. , vol.39 , pp. 3-11
    • Lee, Y.T.1    Lee, K.M.2    An, H.G.3    Joo, S.H.4    Nam, S.D.5    Lee, S.W.6
  • 61
  • 63
    • 0001905173 scopus 로고    scopus 로고
    • Effect of external stress on polarization in ferroelectric thin films
    • Kumazawa T., Kumagai Y., Miura H. Effect of external stress on polarization in ferroelectric thin films. Appl. Phys. Lett. 72:1998;608-610.
    • (1998) Appl. Phys. Lett. , vol.72 , pp. 608-610
    • Kumazawa, T.1    Kumagai, Y.2    Miura, H.3
  • 67
    • 0030679341 scopus 로고    scopus 로고
    • A 1T/1C ferroelectric RAM using a double-level metal process for highly scalable nonvolatile memory
    • Jung D, Kang N, Lee S, Koo B, Lee J, Park J, et al. A 1T/1C ferroelectric RAM using a double-level metal process for highly scalable nonvolatile memory. VLSI Tech Symp, 1997. p. 139-40.
    • (1997) VLSI Tech Symp , pp. 139-140
    • Jung, D.1    Kang, N.2    Lee, S.3    Koo, B.4    Lee, J.5    Park, J.6
  • 70
    • 0029479992 scopus 로고
    • A ferroelectric capacitor over bit-line (F-COB) cell for high density nonvolatile ferroelectric memories
    • Tanabe N, Matsuki T, Saitoh S, Takeuchi T, Kobayashi S, Nakajima T, et al. A ferroelectric capacitor over bit-line (F-COB) cell for high density nonvolatile ferroelectric memories. VLSI Tech Symp, 1995. p. 123-4.
    • (1995) VLSI Tech Symp , pp. 123-124
    • Tanabe, N.1    Matsuki, T.2    Saitoh, S.3    Takeuchi, T.4    Kobayashi, S.5    Nakajima, T.6
  • 71
    • 0024927761 scopus 로고
    • A 16 kb ferroelectric nonvolatile memory with a bit parallel architecture
    • Womack R, Tolsch D. A 16 kb ferroelectric nonvolatile memory with a bit parallel architecture. ISSCC digest of technical papers, 1989. p. 242-3.
    • (1989) ISSCC Digest of Technical Papers , pp. 242-243
    • Womack, R.1    Tolsch, D.2
  • 76
    • 0000382012 scopus 로고
    • Control of structure and electrical properties of lead-zirconium-titanate-based ferroelectric capacitors produced using a layer-by-layer ion beam sputter-deposition technique
    • Auciello O., Gifford K.D., Kingon A.I. Control of structure and electrical properties of lead-zirconium-titanate-based ferroelectric capacitors produced using a layer-by-layer ion beam sputter-deposition technique. Appl. Phys. Lett. 64:1994;2873-2875.
    • (1994) Appl. Phys. Lett. , vol.64 , pp. 2873-2875
    • Auciello, O.1    Gifford, K.D.2    Kingon, A.I.3
  • 79
    • 0000619714 scopus 로고
    • Enhanced fatigue and retention in ferroelectric thin-film memory capacitors by post-top-electrode anneal treatment
    • Thakoor S. Enhanced fatigue and retention in ferroelectric thin-film memory capacitors by post-top-electrode anneal treatment. J. Appl. Phys. 75:1994;5409-5414.
    • (1994) J. Appl. Phys. , vol.75 , pp. 5409-5414
    • Thakoor, S.1
  • 80
    • 33646571747 scopus 로고
    • Radiation effects on ferroelectric thin-film memories: Retention failure mechanisms
    • Scott J.F., Araujo C.A., Meadows H.B., McMillan L.D., Shawabkeh A. Radiation effects on ferroelectric thin-film memories: retention failure mechanisms. J. Appl. Phys. 66:1989;1444-1453.
    • (1989) J. Appl. Phys. , vol.66 , pp. 1444-1453
    • Scott, J.F.1    Araujo, C.A.2    Meadows, H.B.3    McMillan, L.D.4    Shawabkeh, A.5
  • 81
    • 0035031049 scopus 로고    scopus 로고
    • An improvement of retention property by using surface treatment in sol-gel derived PZT films
    • Kim H.H., Lee S.Y., Jung D.J., Koo B.J., Song Y.J., Jang N.W.et al. An improvement of retention property by using surface treatment in sol-gel derived PZT films. Integr. Ferroelectr. 33:2001;9-18.
    • (2001) Integr. Ferroelectr. , vol.33 , pp. 9-18
    • Kim, H.H.1    Lee, S.Y.2    Jung, D.J.3    Koo, B.J.4    Song, Y.J.5    Jang, N.W.6
  • 82
    • 0032267113 scopus 로고    scopus 로고
    • FRAM cell design with highly immunity to fatigue and imprint for 0.5 μm 3 V 1T1C 1Mbit FRAM
    • Tanaka S., Ogiwara R., Itoh Y., Miyakawa T., Takeuchi Y., Doumae S.et al. FRAM cell design with highly immunity to fatigue and imprint for 0.5 μm 3 V 1T1C 1Mbit FRAM. IEDM Tech. Dig. 1998;359-360.
    • (1998) IEDM Tech. Dig. , pp. 359-360
    • Tanaka, S.1    Ogiwara, R.2    Itoh, Y.3    Miyakawa, T.4    Takeuchi, Y.5    Doumae, S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.