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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 5 A, 1997, Pages 2747-2753

Etching effects on ferroelectric capacitors with multilayered electrodes

(2) Chung, Chee Won a Kim, Chang Jung a

a Samsung Advanced Institute of Technology (SAIT) (South Korea)

Author keywords

Dry etching; Etching damage; ICP; Multilayered electrode; PZT; RuOX Pt; Sol gel

Indexed keywords

ETCHING DAMAGE; FERROELECTRIC CAPACITORS; HYSTERESIS LOOPS; INDUCTIVELY COUPLED PLASMA (ICP); MULTILAYERED ELECTRODES;

COERCIVE FORCE; DRY ETCHING; ELECTRODES; FERROELECTRIC DEVICES; FILM PREPARATION; LEAD COMPOUNDS; MAGNETIC HYSTERESIS; MAGNETRON SPUTTERING; PLATINUM; POLARIZATION; SOL-GELS; THIN FILM DEVICES;

CERAMIC CAPACITORS;

EID: 0031145560 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.2747 Document Type: Article

Times cited : (47)

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