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Volumn 18, Issue 11, 1997, Pages 529-531

Novel ferroelectric epitaxial (Ba,Sr)TiO3 capacitor for deep sub-micron memory applications

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRIC DEVICES; FERROELECTRICITY; SEMICONDUCTING SILICON; STRONTIUM COMPOUNDS;

EID: 0031268461     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.641435     Document Type: Article
Times cited : (26)

References (15)
  • 10
    • 0029325525 scopus 로고
    • Heteroepitaxial TiN growth on Si (111) by low energy reactive ion beam epitaxy
    • K. Sano, M. Oose, and T. Kawakubo, "Heteroepitaxial TiN growth on Si (111) by low energy reactive ion beam epitaxy," Jpn. J. Appl. Phys., vol. 34, pp. 3266-3270, 1995.
    • (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 3266-3270
    • Sano, K.1    Oose, M.2    Kawakubo, T.3
  • 13
    • 0029491451 scopus 로고
    • Effects of scaling thickness and Niobium doping level on ferroelectric thin film capacitor memory operation
    • F. Chai, R. Schrimpf, J. Brews, D. Bimie, III, K. Galloway, R. Vogt, and M. Orr, "Effects of scaling thickness and Niobium doping level on ferroelectric thin film capacitor memory operation," in IEDM Tech. Dig., 1995, pp. 123-126.
    • (1995) IEDM Tech. Dig. , pp. 123-126
    • Chai, F.1    Schrimpf, R.2    Brews, J.3    Bimie III, D.4    Galloway, K.5    Vogt, R.6    Orr, M.7
  • 14
    • 0030415541 scopus 로고    scopus 로고
    • A new high temperature electrode-barrier technology on high density ferroelectric capacitor structure
    • S. Ohnishi, M. Nagata, J. Kudo, K. Sakiyama, S. Desu, H. Bhatt, D. Vijay, and Y. Hwang, "A new high temperature electrode-barrier technology on high density ferroelectric capacitor structure," in IEDM Tech Dig., 1996, pp. 699-702.
    • (1996) IEDM Tech Dig. , pp. 699-702
    • Ohnishi, S.1    Nagata, M.2    Kudo, J.3    Sakiyama, K.4    Desu, S.5    Bhatt, H.6    Vijay, D.7    Hwang, Y.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.