Integration and electrical properties of diffusion barrier for high density ferroelectric memory

Applied Physics Letters

Volumn 76, Issue 4, 2000, Pages 451-453

  Song, Yoon J ^a   Kim, H H ^a   Lee, Sung Y ^a   Jung, D J ^a   Koo, B J ^a   Lee, J K ^a   Park, Y S ^a   Cho, H J ^a   Park, S O ^a   Kim, Kinam ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000388685     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125784     Document Type: Article

References (9)

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