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Volumn 11, Issue 9, 2002, Pages 1623-1628
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Electron cyclotron resonance plasma-assisted pulsed laser deposition of boron carbon nitride films
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Author keywords
Boron carbon nitride; Electron cyclotron resonance; Plasma assisted deposition; Pulsed laser deposition
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Indexed keywords
ADHESION;
BORON;
CARBON NITRIDE;
CHEMICAL BONDS;
ELECTRON CYCLOTRON RESONANCE;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
LASER PULSES;
LOW TEMPERATURE EFFECTS;
MICROWAVES;
NITROGEN;
PLASMA THEORY;
PULSED LASER DEPOSITION;
SILICON;
SUBSTRATES;
X RAY PHOTOELECTRON SPECTROSCOPY;
MICROWAVE DISCHARGES;
THIN FILMS;
BORON;
BORON CARBIDE;
BORON CARBON NITRIDE;
CARBON;
NITROGEN;
FILM;
ATOMIC RATIO;
CHEMICAL BOND;
CHEMICAL STRUCTURE;
ELECTRON CYCLOTRON RESONANCE;
FILM;
INFRARED SPECTROSCOPY;
RAMAN SPECTROMETRY;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 0036721103
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(02)00047-X Document Type: Article |
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Times cited : (46)
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References (32)
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