Silicon nitride films synthesized by reactive pulsed laser deposition in an electron cyclotron resonance nitrogen plasma

Thin Solid Films

Volumn 350, Issue 1, 1999, Pages 101-105

  Wu, J D ^a   Sun, J ^a   Zhong, X X ^a   Zhou, Z Y ^b   Wu, C Z ^a   Li, F M ^a  

^a State Key Laboratory for Modification of Chemical Fibers and Polymer Materials   (China)

^b FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON CYCLOTRON RESONANCE; EMISSION SPECTROSCOPY; LASER ABLATION; NITROGEN; PLASMA APPLICATIONS; PULSED LASER APPLICATIONS; SILICON NITRIDE; STOICHIOMETRY; SYNTHESIS (CHEMICAL);

ELECTRON CYCLOTRON RESONANCE PLASMA; REACTIVE PULSED LASER DEPOSITION;

DIELECTRIC FILMS;

EID: 0032677756     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00324-7     Document Type: Article

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