XPS spectra of thin CNx films prepared by chemical vapor deposition

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 591-594

  Beshkov, G ^a   Dimitrov, D B ^a   Georgiev, St ^a   Juan Cheng, D ^b   Petrov, P ^a   Velchev, N ^c   Krastev, V ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b FUDAN UNIVERSITY   (China)

^c UNIVERSITY OF PLOVDIV   (Bulgaria)

Author keywords

Thin CNx films; Vapor deposition; XPS spectra

Indexed keywords

CHEMICAL BONDS; CRYSTAL STRUCTURE; NITRIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

AMORPHOUS FILMS;

EID: 0032621864     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00269-6     Document Type: Article

References (10)

1. Liu A.J., Cohen M.V. Phys. Rev. B. 41:1990;10727.
2. Cohen M.V. Science. 261:1993;307.
3. Cuomo S.S., Leary P.A., Yo D., Reuter V., Frish M. J. Vac. Sci. Technol. 16:1979;299.
4. Toring C.S., Sivertsen S.M., Judy S.H., Chang C. J. Mater. Res. 5:1990;2490.
5. Chen M.J., Li D., Lin X., Dravid P., Chung M., Wong M.S., Sproul W.D. J. Vac. Sci. Technol. A. 11:1993;521.
6. Li D., Chung J., Wong M., Sproul W.D. J. Appl. Phys. 745:1993;219.
7. Fang P.H. J. Mater. Sci. Lett. 14:1995;536.
8. Barr T.L. Crit. Rev. Anal. Chem. 22:1991;113.
9. Lopez S., Dunlop M., Benmalek M., ourillon C., Wong M.S., Sproul W.D. Surf. Interface Anal. 25:1997;315.
10. Bhatacharyya S., Cardinaud C., Turban G. J. Appl. Phys. 83:1988;4491.