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Volumn 9, Issue 3, 2000, Pages 1233-1237
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Field emission characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
BORON COMPOUNDS;
COMPOSITION EFFECTS;
CRACK INITIATION;
ELECTRIC FIELD EFFECTS;
ELECTRON EMISSION;
ENERGY GAP;
FILM PREPARATION;
METHANE;
NITROGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SYNTHESIS (CHEMICAL);
BORON CARBON NITRIDE FILMS;
BORONTRICHLORIDE;
OPTICAL BAND GAP;
NITRIDES;
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EID: 0033746727
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(99)00306-4 Document Type: Article |
Times cited : (49)
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References (25)
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