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Volumn 9, Issue 3, 2000, Pages 1233-1237

Field emission characteristics of boron carbon nitride films synthesized by plasma-assisted chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; COMPOSITION EFFECTS; CRACK INITIATION; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; ENERGY GAP; FILM PREPARATION; METHANE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SYNTHESIS (CHEMICAL);

EID: 0033746727     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00306-4     Document Type: Article
Times cited : (49)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.