메뉴 건너뛰기




Volumn 8, Issue 2-5, 1999, Pages 402-405

Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering

Author keywords

Boron carbide; Hard coatings; Ion bombardment; Magnetron sputtering

Indexed keywords

AMORPHOUS FILMS; ARGON; BORON CARBIDE; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROHARDNESS; OPTICAL PROPERTIES; RESIDUAL STRESSES; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS;

EID: 0032613757     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00274-x     Document Type: Article
Times cited : (82)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.