Structural and electrical characterization of BC2N thin films

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 334-336

  Watanabe, M O ^a,c   Sasaki, T ^b   Itoh, S ^a   Mizushima, K ^a  

^a TOSHIBA CORPORATION   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

Author keywords

Electrical properties and measurements; Semiconductors; Structural properties; X ray photoelectron spectroscopy

Indexed keywords

BINDING ENERGY; BORON COMPOUNDS; CHARACTERIZATION; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; ELECTRON ENERGY LEVELS; ELECTRON TRANSPORT PROPERTIES; SEMICONDUCTOR MATERIALS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LEVEL HYBRID; BORON CARBON NITRIDE THIN FILMS; CHEMICAL SHIFTS; HALL COEFFICIENTS; MICROSCOPIC BONDING; STRUCTURAL PROPERTIES; TEMPERATURE DEPENDENCIES OF THE RESISTIVITY;

THIN FILMS;

EID: 0030219230     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08656-7     Document Type: Article

References (13)

1. A.R. Badzian, T. Niemyski, S. Appenheimer and E. Olkusnik, in F.A. Glaski (ed.), Proc. Int. Conf. on Chemical Vapor Deposition, American Nuclear Society, Hinsdale, IL, 1972, Vol. 3, p. 747.
2. A.Y. Liu, R.M. Wentzcovitch and M.L. Cohen, Phys. Rev. B, 39 (1989) 1760.
3. S. Itoh and H. Nozaki, in D.J. Lockwood (ed.), Proc. 22nd Int. Conf. on the Physics of Semiconductors, 1994, World Scientific, Singapore, 1995, p. 145.
4. J. Kouvetakis, T. Sasaki, C. Shen, R. Hagiwara, M. Lerner, K.M. Krishnan and N. Bartlett, Synthetic Metals, 34 (1989) 1.
5. B.M. Way, J.R. Dahn, T. Tiedje, K. Myrtle and M. Kasrai, Phys. Rev. B, 45 (1992) 1697.
6. J. Bill and R. Riedel, Mat. Res. Soc. Symp. Proc., 271 (1992) 839.
7. M. Kawaguchi and T. Kawashima, J. Chem. Soc., Chem. Commun., (1993) 1133.
8. L. Maya, J. Am. Ceram. Soc., 71 (1988) 1104.
9. M.O. Watanabe, T. Sasaki, S. Itoh and K. Mizushima, J. Appl. Phys., 75 (1995) 2880.
10. C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder and G.E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer, Physical Electronics Division, Eden Prairie, Minnesota, 1979.
11. J.P. Rivière, Y. Pacaud and M. Cahoreau, Thin Solid Films, 227 (1993) 44.
12. H. Künzli, P. Gantenbein, R. Steiner and P. Oelhafen, Fresenius J. Anal. Chem., 546 (1993) 41.
13. T. Sasaki, M. Akaishi, S. Yamaoka, Y. Fujiki and T. Oikawa, Chem. Mater., 5 (1993) 695.