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Volumn 11, Issue 8, 2002, Pages 1511-1517

Dependence of the composition and bonding structure of carbon nitride films deposited by direct current plasma assisted pulsed laser ablation on the deposition temperature

(9) Cheng, Y H a,d Qiao, X L a Chen, J G a Wu, Y P a Xie, C S a Wang, Y Q a Xu, D S a Mo, S B b Sun, Y B c

a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b WUHAN UNIVERSITY (China)

c WUHAN UNIVERSITY OF TECHNOLOGY (China)

d CHEMNITZ UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

Carbon nitride films; Deposition temperature; Laser ablation deposition; Structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; BONDING; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; PLASMA APPLICATIONS; PULSED LASER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING STRUCTURE;

CARBON NITRIDE;

CARBON NITRIDE; FILM; HARDNESS; PLASMA TREATMENT; STRUCTURAL ANALYSIS;

EID: 0036646907 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(02)00055-9 Document Type: Article

Times cited : (30)

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