Influence of plasma parameters on the growth and properties of magnetron sputtered CNx thin films

Journal of Applied Physics

Volumn 88, Issue 1, 2000, Pages 524-532

  Hellgren, Niklas ^a   Macák, Karol ^a,b   Broitman, Esteban ^a   Johansson, Mats P ^a,c   Hultman, Lars ^a   Sundgren, Jan Eric ^c,d  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^c Thin Film Electronics AB   (Sweden)

^d CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001470087     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373690     Document Type: Article

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