Relationship between the structure and the optical and electrical properties of ion beam deposited CNx films

Thin Solid Films

Volumn 322, Issue 1-2, 1998, Pages 245-253

  Zhao, X A ^a,b   Ong, C W ^a   Tsang, Y C ^a   Chan, K F ^a   Choy, C L ^a   Chan, P W ^a   Kwok, R W M ^c  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b SHANGHAI RESEARCH INSTITUTE OF MATERIALS   (China)

^c CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Conductivity; Infrared spectroscopy; Sputtering; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; FILM PREPARATION; INFRARED SPECTROSCOPY; ION BEAMS; LIGHT ABSORPTION; OPTICAL PROPERTIES; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS;

THIN FILMS;

EID: 0032496506     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00940-1     Document Type: Article

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