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Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1280-1285

Reactively r.f. magnetron sputtered carbon nitride films

(3) Sebald, T a Kaltofen, R a Weise, G a

a IFW DRESDEN (Germany)

Author keywords

Carbon nitride; Plasma ion bombardment; RF magnetron sputtering

Indexed keywords

EID: 0000066266 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(98)80003-0 Document Type: Article

Times cited : (16)

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