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Volumn 182, Issue 1-2, 2001, Pages 32-39

Influence of deposition pressure on the composition and structure of carbon nitride films deposited by direct current plasma assisted pulsed laser ablation

(12) Cheng, Y H a,b Sun, Z H a Tay, B K b Lau, S P b Qiao, X L a Chen, J G a Wu, Y P a Xie, C S a Wang, Y Q a Xu, D S a Mo, S B c Sun, Y B d

a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c WUHAN UNIVERSITY (China)

d WUHAN UNIVERSITY OF TECHNOLOGY (China)

Author keywords

Carbon nitride films; Deposition pressure; Laser ablation deposition; Structure

Indexed keywords

BONDING; CARBON NITRIDE; CHEMICAL BONDS; COMPOSITION; CRYSTAL ATOMIC STRUCTURE; ELECTRON ENERGY LEVELS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; LASER PULSES; NITROGEN; PLASMA APPLICATIONS; PRESSURE EFFECTS; PULSED LASER DEPOSITION; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIRECT CURRENT PLASMAS;

THIN FILMS;

EID: 0035813563 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(01)00403-2 Document Type: Article

Times cited : (20)

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