Composition and crystal structure of carbon nitride films prepared by the electron cyclotron resonance plasma sputtering method

Applied Physics Letters

Volumn 73, Issue 12, 1998, Pages 1652-1654

  Tani, Youji ^a   Aoi, Yoshifumi ^a   Kamijo, Eiji ^a  

^a RYUKOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001538689     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122235     Document Type: Article

References (19)

1. A. Y. Liu and M. L. Cohen, Science 249, 841 (1989).
2. A. Y. Liu and M. L. Cohen, Phys. Rev. B 41, 10727 (1990).
3. J. H. Kaufman, S. Mertin, and D. D. Saperstein, Phys. Rev. B 39, 13053 (1989).
4. D. Li, Y. W. Cung, M. S. Wong, and W. D. Sproul, J. Appl. Phys. 74, 219 (1993).
5. C. Niu, Y. Z. Lu, and C. M. Lieber, Science 261, 334 (1993).
6. K. M. Yu, M. L. Cohen, E. E. Haller, W. L. Hanson, A. Y. Lu, and I. C. Wu, Phys. Rev. B 49, 5034 (1994).
7. F. Rossi, B. Andre, A. van Veen, P. E. Mijnarends, H. Schut, F. Labohm, H. Dunlop, M. P. Delplancke, and K. Hubbard, J. Mater. Res. 9, 2440 (1994).
8. K. Ogata, J. F. D. Chubaci, and F. Fujimoto, J. Appl. Phys. 76, 3791 (1994).
9. T. Yen and C. Chou, Appl. Phys. Lett. 67, 2081 (1995).
10. L. Wan and R. F. Egerton, Thin Solid Films 279, 34 (1996).
11. R. Kaltofen, T. Sebald, and G. Weise, Thin Solid Films 290, 112 (1996).
12. X. He, L. Shu, W. Li, and H. Li, J. Mater. Res. 12, 1595 (1997).
13. Y. Taki, T. Kitagawa, and O. Takai, Thin Solid Films 304, 183 (1997).
14. A. Y. Liu and R. M. Wentzcovich, Phys. Rev. B 50, 10362 (1994).
15. Y. Guo and W. A. Goddard III, Chem. Phys. Lett. 237, 72 (1995).
16. E. Kamijo, T. Nakamura, and Y. Tani, Nucl. Instrum. Methods Phys. Res. B 121, 110 (1997).
17. S. Matuo, M. Kiuti, and T. Ono, Proceedings of the 10th Symposium on Ion Source and Ion-Assisted Technology, Tokyo, Japan, 1986, p. 246.
18. F. Tuinstra and J. L. Koenig, J. Chem. Phys. 53, 1126 (1970).
19. R. J. Nemanich and S. A. Solin, Phys. Rev. B 20, 392 (1979).