SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Applied Polymer Science

Volumn 80, Issue 11, 2001, Pages 2084-2092

Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition

(2) Labelle, Catherine B a Gleason, Karen K a

a Massachusetts Institute of Technology Cambridge (United States)

Author keywords

C2H2F4; Electron cyclotron resonance; Fluorocarbon; Optical emission spectroscopy; Plasma deposition

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; FLUOROCARBONS; ION BOMBARDMENT;

TETRAFLUOROETHANE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0035854133 PISSN: 00218995 EISSN: None Source Type: Journal
DOI: 10.1002/app.1308 Document Type: Article

Times cited : (23)

References (53)

1
- 0003699181
- Lattice Press: Sunset Beach, CA
- (1990) Silicon Processing for the VLSI Era , vol.2
- Wolf, S.¹

2
- 0003679027
- McGraw-Hill: New York
- (1983) VLSI Technology
- Sze, S.M.¹

3
- 0004201645
- Academic: New York
- (1985) Plasma Polymerization
- Yasuda, H.¹

4
- 0003551592
- Academic: Boston
- (1990) Plasma Deposition, Treatment, and Etching of Polymers
- D'Agostino, R.¹

5
- 0032650472
- (1999) IBM J Res Dev , vol.43 , pp. 5
- Cote, D.R.¹ Nguyen, S.V.² Stamper, A.K.³ Armbrust, D.S.⁴ Tobben, D.⁵ Conti, R.A.⁶ Lee, G.Y.⁷

6
- 0000212494
- (1994) Semicond Int , vol.17 , Issue.13 , pp. 52
- Singer, P.¹

7
- 0002311717
- (1995) Semicond Int , vol.18 , Issue.5 , pp. 71
- Laxman, R.K.¹

8
- 30844463428
- (1996) Semicond Int , vol.19 , Issue.5 , pp. 88
- Singer, P.¹

9
- 0007147364
- (1998) Semicond Int , vol.21 , Issue.10 , pp. 64
- Peters, L.¹

10
- 0031256187
- (1997) MRS Bull , vol.22 , Issue.10 , pp. 55
- Endo, K.¹

11
- 0001713728
- Urban, M. W.; Craver, C. D., Eds.; American Chemical Society: Washington, DC
- (1993) Structure-Property Relations in Polymers: Spectroscopy and Performance , vol.236 , pp. 745
- Savage, C.R.¹ Timmons, R.B.² Lin, J.W.³

12
- 0004991083
- VMIC: Santa Clara, CA
- (1999) History and Future of Fluorocarbon CVD Low Kappa Dielectric Thin Films , pp. 11
- Gleason, K.K.¹

13
- 0040400378
- (1996) Appl Phys Lett , vol.68 , pp. 2864
- Endo, K.¹ Tatsumi, T.²

14
- 0028462138
- (1994) Jpn J Appl Phys Part 1 , vol.33 , Issue.7 B , pp. 4181
- Takahashi, K.¹ Hori, M.² Kishimoto, S.³ Goto, T.⁴

15
- 21344499352
- (1994) J Vac Sci Technol A , vol.12 , pp. 323
- Oehrlein, G.S.¹ Zhang, Y.² Vender, D.³ Haverlag, M.⁴

16
- 0000546244
- (1996) Chem Mater , vol.8 , pp. 2212
- Wang, J.-H.¹ Chen, J.-J.² Timmons, R.B.³

17
- 0030192111
- (1996) J Vac Sci Technol A , vol.14 , pp. 2011
- Takahashi, K.¹ Hori, M.² Goto, T.³

18
- 0030516057
- (1996) J Vac Sci Technol A , vol.14 , pp. 2004
- Takahashi, K.¹ Hori, M.² Goto, T.³

19
- 0000683947
- (1998) Appl Phys Lett , vol.72 , pp. 3353
- Ma, Y.¹ Yang, H.² Guo, J.³ Sathe, C.⁴ Agui, A.⁵ Nordgren, J.⁶

20
- 0031143060
- (1997) J Electrochem Soc , vol.144 , pp. 1797
- Takeishi, S.¹ Kudo, H.² Shinohara, R.³ Hoshino, M.⁴ Fukuyama, S.⁵ Yamaguchi, J.⁶ Yamada, M.⁷

21
- 0032476377
- (1998) Thin Solid Films , vol.332 , pp. 362
- Mountsier, T.W.¹ Samuels, J.A.²

22
- 0031146170
- (1997) Appl Phys Lett , vol.70 , pp. 2616
- Endo, K.¹ Tatsumi, T.²

23
- 0032001704
- (1998) J Appl Polym Sci , vol.67 , pp. 1489
- Limb, S.J.¹ Edell, D.J.² Gleason, E.F.³ Gleason, K.K.⁴

24
- 0030104436
- (1996) J Vac Sci Technol A , vol.14 , pp. 384
- Haverlag, M.¹ Stoffels, W.W.² Stoffels, E.³ Kroesen, G.M.W.⁴ De Hoog, F.J.⁵

25
- 0033440283
- (1999) J Vac Sci Technol A , vol.17 , pp. 445
- Labelle, C.B.¹ Gleason, K.K.²

26
- 0000634083
- (1999) J Vac Sci Technol A , vol.17 , pp. 3419
- Labelle, C.B.¹ Karecki, S.² Reif, R.³ Gleason, K.K.⁴

27
- 0001032544
- (1991) Chem Mater , vol.3 , pp. 575
- Savage, C.R.¹ Timmons, R.B.² Lin, J.W.³

28
- 0031502454
- (1997) J Vac Sci Technol A , vol.15 , pp. 1814
- Limb, S.J.¹ Gleason, K.K.² Edell, D.J.³ Gleason, E.F.⁴

29
- 0032045768
- (1998) Jpn J Appl Phys Part 1 , vol.37 , Issue.4 B , pp. 2302
- Fujiwara, N.¹ Maruyama, T.² Miyatake, H.³

30
- 0027814426
- (1993) Jpn J Appl Phys Part 1 , vol.32 , Issue.12 B , pp. 6080
- Samukawa, S.¹

31
- 21544435491
- (1994) Appl Phys Lett , vol.64 , pp. 3398
- Samukawa, S.¹

32
- 0030134379
- (1996) Plasma Sources Sci Technol , vol.5 , pp. 139
- Ahn, T.H.¹ Nakamura, K.² Sugai, H.³

33
- 0030567567
- (1996) Macromolecules , vol.29 , pp. 4220
- Hynes, A.M.¹ Shenton, M.J.² Badyal, J.P.S.³

34
- 0000425778
- (1998) Chem Mater , vol.10 , pp. 2177
- Hynes, A.¹ Badyal, J.P.S.²

35
- 0027641933
- (1993) Jpn J Appl Phys Part 2 , vol.32 , Issue.8 A
- Takahashi, K.¹ Hori, M.² Goto, T.³

36
- 0027589898
- (1993) Jpn J Appl Phys Part 2 , vol.32 , Issue.5 A
- Takahashi, K.¹ Hori, M.² Maruyama, K.³ Kishimoto, S.⁴ Goto, T.⁵

37
- 0028481141
- (1994) Jpn J Appl Phys Part 1 , vol.33 , pp. 4745
- Takahashi, K.¹ Hori, M.² Goto, T.³

38
- 0019021889
- (1980) J Appl Phys , vol.51 , pp. 3134
- Coburn, J.W.¹ Chen, M.²

39
- 0001447476
- (1992) J Appl Phys , vol.71 , pp. 3186
- Kiss, L.D.B.¹ Nicolai, J.-P.² Conner, W.T.³ Sawin, H.H.⁴

40
- 0021466219
- (1984) J Appl Phys , vol.56 , pp. 245
- Gottscho, R.A.¹ Donnelly, V.M.²

41
- 0019730296
- (1981) Plasma Chem Plasma Process , vol.1 , pp. 365
- D'Agostino, R.¹ Colaprico, V.² Cramarossa, F.³

42
- 0019539448
- (1981) J Appl Phys , vol.52 , pp. 1259
- D'Agostino, R.¹ Cramarossa, F.² De Benedictis, S.³ Ferraro, G.⁴

43
- 0004032167
- National Bureau of Standards: Washington, DC
- (1980) Wavelengths and Transition Probabilities for Atoms and Atomic Ions , vol.1
- Reader, J.¹ Corliss, C.H.²

44
- 0003740740
- Chapman & Hall; London
- (1963) The Identification of Molecular Spectra, 3rd ed.
- Pearse, R.W.B.¹ Gaydon, A.G.²

45
- 0003516749
- W. H. Freeman & Company: New York
- (1990) Physical Chemistry, 4th ed.
- Atkins, P.W.¹

46
- 0032181109
- (1998) J Phys IV , vol.8 , Issue.P7 , pp. 391
- Farhat, S.¹ Findeling, C.² Silva, F.³ Hassouni, K.⁴ Gicquel, A.⁵

47
- 0023348209
- (1987) J Mater Sci , vol.22 , pp. 1557
- Mitsuda, Y.¹ Kojima, Y.² Yoshida, T.³ Akashi, K.⁴

48
- 0022711455
- (1986) J Mater Sci Lett , vol.5 , pp. 565
- Saito, Y.¹ Matsuda, S.² Nogita, S.³

49
- 0023979681
- (1988) J Mater Sci , vol.23 , pp. 842
- Saito, Y.¹ Sato, K.² Tanaka, H.³ Fujita, K.⁴ Matuda, S.⁵

50
- 0001570702
- (1989) J Vac Sci Technol A , vol.7 , pp. 899
- Forster, J.¹ Holber, W.²

51
- 0031191076
- (1997) Thin Solid Films , vol.304 , pp. 294
- Angra, S.K.¹ Kumar, P.² Banerfie, P.C.³ Bajpai, R.P.⁴

52
- 0028378253
- (1994) IEEE Trans Plasma Sci , vol.22 , pp. 31
- Graves, D.B.¹

53
- 0028495005
- (1994) J Appl Polym Sci , vol.53 , pp. 1631
- O'Keefe, M.J.¹ Rigsbee, J.M.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.