Characterization of electron cyclotron resonance source plasma for etching and deposition

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 294-298

  Angra, S K ^a   Kumar, Parshant ^a   Banerjie, P C ^a   Bajpai, R P ^a  

^a CSIR CENTRAL SCIENTIFIC INSTRUMENTS ORGANISATION   (India)

Author keywords

Chemical vapour deposition; Cyclotron resonance studies; Etching; Plasma processing and deposition

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENT MEASUREMENT; FLUORINE COMPOUNDS; OXYGEN; PLASMA ETCHING; PLASMA PROBES; PLASMA SOURCES;

CARBONTETRAFLUORIDE; MICROWAVE PLASMA;

ELECTRON CYCLOTRON RESONANCE;

EID: 0031191076     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00018-7     Document Type: Article

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