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Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 362-368

Precursor selection for plasma deposited fluorinated amorphous carbon films

(2) Mountsier, Thomas W a Samuels, John A a

a NOVELLUS SYSTEMS INC (United States)

Author keywords

Fluorinated amorphous carbon (FlAC); Intermetal dielectric material; Low k; Plasma enhanced chemical vapor deposition

Indexed keywords

DIELECTRIC FILMS; FLUORINE; HIGH TEMPERATURE OPERATIONS; LEAKAGE CURRENTS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRENGTH OF MATERIALS; THERMODYNAMIC STABILITY;

FLUORINATED AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0032476377 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)01202-4 Document Type: Article

Times cited : (43)

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