Negative ion measurements and etching in a pulsed-power inductively coupled plasma in chlorine

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 139-144

  Ahn, T H ^a,b   Nakamura, K ^a   Sugai, H ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; ELECTRIC FIELD MEASUREMENT; ELECTRONS; GATES (TRANSISTOR); PLASMA SHEATHS; PLASMA SOURCES;

ANOMALOUS SIDE WALL ETCHING; INDUCTIVELY COUPLED PLASMAS;

PLASMA ETCHING;

EID: 0030134379     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/005     Document Type: Article

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