Fluorinated amorphous carbon as a low-dielectric-constant interlayer dielectric

MRS Bulletin

Volumn 22, Issue 10, 1997, Pages 55-58

  Endo, Kazuhiko ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; FILM GROWTH; PERMITTIVITY; SILICA; THERMODYNAMIC STABILITY;

FLUORINATED AMORPHOUS CARBON FILMS; LOW DIELECTRIC CONSTANT INTERLAYER DIELECTRICS; THREE LEVEL METALLIZATION;

AMORPHOUS FILMS;

EID: 0031256187     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/S0883769400034217     Document Type: Article

References (20)

1. A.E. Fering, B.C. Auman, and E.R. Wonchoba, Macromolecules 26 (1993) p. 2779.
2. T.C. Nason, J.A. Moore, and T.M. Lu, Appl. Phys. Lett. 60 (1992) p. 1866.
3. S.F. Hahn, S.J. Martin, M.L. Mckelvy, and D.W. Patrick, Macromolecules 26 (1993) p. 3870.
4. H. Yasuda, Plasma Polymerization (Academic, New York, 1985).
5. K. Endo and T. Tatsumi, J. Appl. Phys. 78 (1995) p. 1370.
6. Proc. DUMIC Conf., edited by S. Takeishi, H. Kudo, R. Shinohara, M. Hoshino, S. Fukuyama, J. Yamaguchi, and Y. Yamada (San José, CA, 1996) p. 71.
7. S.J. Limb, C.B. Labelle, K.K. Gleason, D.J. Edell, and E.F. Gleason, Appl. Phys. Lett. 68 (1996) p. 2810.
8. T.W. Mountsier and D. Kumar, presented at Symposium H, Materials Research Society Meeting, Boston, 1996.
9. A. Grill, V. Patel, S.A. Cohen, D.C. Edelstein, J.R. Paraszczak, and C. Jahnes, ibid.
10. K. Endo and T. Tatsumi, Appl. Phys. Lett. 68 (1996) p. 2864.
11. J.A. Theil, F. Mertz, M. Yairi, K. Seaward, G. Ray, and G. Kooi, presented at Symposium N, Materials Research Society Meeting, San Francisco, 1997.
12. W.W. Lee, G. Tyndall, and M. Crowder, presented at the Adv. Metall. and Intercon. Sys. for ULSI Appl. Portland, OR, 1995.
13. S.A. Robles, L. Vasquez, M. Eizenberg, and F. Moghadam, presented at Symposium N, Materials Research Society Meeting, San Francisco, 1997.
14. K. Endo, T. Tatsumi, and Y. Matsubara, Jpn. J. Appl. Phys. 35 (1996) p. L1348.
15. K. Machida and H. Oikawa, J. Vac. Sci. Technol. B 4 (1986) p. 818.
16. T. Mogami, M. Morimoto, H. Okabayashi, and E. Nagasawa, ibid. (1985) p. 857.
17. R. d'Agostino, F. Cramarossa, and F. Illuzzi, J. Appl. Phys. 61 (1987) p. 2754.
18. Y. Matsubara, K. Endo, T. Tatsumi, H. Ueno, K. Sugai, and T. Horiuch, IEDM Tech. Digest (1996) p. 369.
19. K. Endo, T. Tatsumi, and Y. Matsubara, Appl. Phys. Lett. 70 (1997) p. 1078.
20. K.L. Smith and K.M. Black, J. Vac. Sci. Technol. A 2 (1984) p. 744.