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Volumn 8, Issue 7, 1998, Pages

Role of the plasma composition at the surface on diamond growth

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; COMPOSITION; MORPHOLOGY; SURFACES;

EID: 0032181109     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1998734     Document Type: Article
Times cited : (3)

References (13)
  • 2
    • 0013572833 scopus 로고
    • Scaling laws for diamond chemical-vapor deposition. II. Atomic hydrogen transport
    • Goodwill D. G., "Scaling laws for diamond chemical-vapor deposition. II. Atomic hydrogen transport", J. Appl. Phys. 74 (11), 6895, (1993).
    • (1993) J. Appl. Phys. , vol.74 , Issue.11 , pp. 6895
    • Goodwill, D.G.1
  • 4
    • 0000318867 scopus 로고
    • Heterogenous Reactions of H Atoms and CH3 Radicals with a Diamond Surface in the 300-1133 K Temperature Range
    • Krasnoperov Lev N., I.J. Kalinovski, H. N. Chu and D. Gutman, "Heterogenous Reactions of H Atoms and CH3 Radicals with a Diamond Surface in the 300-1133 K Temperature Range", J Phys. Chem., 97, pp 11787-11796, (1993).
    • (1993) J Phys. Chem. , vol.97 , pp. 11787-11796
    • Krasnoperov Lev, N.1    Kalinovski, I.J.2    Chu, H.N.3    Gutman, D.4
  • 5
  • 7
    • 0001397857 scopus 로고
    • Experimental and calculational study on diamond growth by an advanced hot filament chemical vapor deposition method
    • Kondoh, E., Ohta, T., Mitomo, T., Ohtsuka, K., "Experimental and calculational study on diamond growth by an advanced hot filament chemical vapor deposition method", J. Appl. Phys. 72 (2), pp 705-71. (1992).
    • (1992) J. Appl. Phys. , vol.72 , Issue.2 , pp. 705-771
    • Kondoh, E.1    Ohta, T.2    Mitomo, T.3    Ohtsuka, K.4
  • 8
    • 0000813262 scopus 로고
    • 3 and other species during Filament-assisted diamond growth
    • 3 and other species during Filament-assisted diamond growth", Applied Physics Letters, Vol. 59, 12, pp1427-1429, (1991).
    • (1991) Applied Physics Letters , vol.59 , Issue.12 , pp. 1427-1429
    • Hsu, W.L.1
  • 9
    • 0343814229 scopus 로고
    • Gas-phase kinetics during microwave plasma-assisted diamond deposition. Is the hydrocarbon distribution is dictated by neutral-neutral interactions ?
    • Hsu, W. L., "Gas-phase kinetics during microwave plasma-assisted diamond deposition. Is the hydrocarbon distribution is dictated by neutral-neutral interactions ?", J. Appl. Phys. 72 (7), pp 3102-3109 (1992).
    • (1992) J. Appl. Phys. , vol.72 , Issue.7 , pp. 3102-3109
    • Hsu, W.L.1
  • 10
    • 36449009052 scopus 로고
    • Scaling laws for diamond chemical-vapor deposition. I. Diamond Surface Reaction
    • Goodwill D. G., "Scaling laws for diamond chemical-vapor deposition. I. Diamond Surface Reaction", J. Appl. Phys. 74 (11), pp 6888-6894, (1993).
    • (1993) J. Appl. Phys. , vol.74 , Issue.11 , pp. 6888-6894
    • Goodwill, D.G.1
  • 11
    • 0000014123 scopus 로고
    • Filament-assisted diamond growth kinetics
    • Harris, S. J., A. M. Weiner, Perry, T. A., "Filament-assisted diamond growth kinetics." J. Appl. Phys. 70 (3): pp1385-1391, (1991).
    • (1991) J. Appl. Phys. , vol.70 , Issue.3 , pp. 1385-1391
    • Harris, S.J.1    Weiner, A.M.2    Perry, T.A.3
  • 13
    • 0038436097 scopus 로고    scopus 로고
    • On the use of Actinometry for estimating relative H-alom densities and electron energy evolution in plasma enhanced diamond deposition reactors : Validation of the method and spatial analysis of the plasma
    • submitted to
    • Gicquel A., M. Chenevier, K. Hassouni, M. Dubus and A. Tserepi, "On the use of Actinometry for estimating relative H-alom densities and electron energy evolution in plasma enhanced diamond deposition reactors : validation of the method and spatial analysis of the plasma.", submitted to J. Appl. Phys. in 1997.
    • (1997) J. Appl. Phys.
    • Gicquel, A.1    Chenevier, M.2    Hassouni, K.3    Dubus, M.4    Tserepi, A.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.