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Volumn 13, Issue 11, 2001, Pages 4147-4153

Microlithographic assessment of a novel family of transparent and etch-resistant chemically amplified 193-nm resists based on cyclopolymers

(5) Klopp, J M a,b Pasini, D a,b Byers, J D a,b,c Grant Willson, C a,b,d Frechet J M J a,b

a UNIVERSITY OF CALIFORNIA (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c SEMATECH (United States)

d The University of Texas at Austin (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMER;

ARTICLE; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; EVALUATION; MOLECULAR WEIGHT; OPTICS; POLYMERIZATION; REACTION ANALYSIS; STRUCTURE ANALYSIS;

EID: 0035180167 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm010431w Document Type: Article

Times cited : (43)

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