SCOPUS 정보 검색 플랫폼

Volumn 42, Issue 4, 2001, Pages 1757-1761

Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography

Author keywords

193 nm (ArF) resist materials; Muliti alicyclic polymers; Norbornene polymers

Indexed keywords

ADHESION; DISSOLUTION; EXCIMER LASERS; GAS LASERS; MASKS; PHOTORESISTS; PLASMA ETCHING; POLYMERIZATION;

ACID-CATALYZED THERMOLYSIS; MULTI-ALICYCLIC POLYMERS; NORBORNENE POLYMERS;

COPOLYMERS;

POLYMER;

ADHESION; ARTICLE; CHEMICAL STRUCTURE; DISSOLUTION; LASER; POLYMERIZATION; STRUCTURE ANALYSIS; SYNTHESIS;

EID: 0034138298 PISSN: 00323861 EISSN: None Source Type: Journal
DOI: 10.1016/S0032-3861(00)00559-0 Document Type: Article

Times cited : (12)

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