Organic imaging materials: A view of the future

Journal of Physical Organic Chemistry

Volumn 13, Issue 12, 2000, Pages 767-774

  Stewart, Michael D ^a   Patterson, Kyle ^b   Somervell, Mark H ^a   Willson, C Grant ^a,b  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Lithography; Organic imaging materials; Photoresists; Thin layer imaging

Indexed keywords

EID: 0000445094     PISSN: 08943230     EISSN: None     Source Type: Journal    
DOI: 10.1002/1099-1395(200012)13:12<767::AID-POC323>3.0.CO;2-A     Document Type: Article

References (53)

1. http://www.amd.com.
2. Willson CG, Dammel RA, Reiser A. Proc. Soc. Photo-Opt. Instrum. Eng. 1997; 3051: 28.
3. Dammel RA. Diazonapthoquinone-based Resists. SPIE Optical Engineering Press: Bellingham, WA, 1993.
4. Thompson LF, Willson CG, Bowden MJ. Introduction to Microlithography. American Chemical Society: Washington, DC, 1994.
5. Reiser A. Photoreactive Polymers - The Science and Technology of Resists. John Wiley & Sons: New York, 1989.
6. Ehrlich DJ, Rothschild M. Microelectron Eng. 1989; 9: 27.
7. Schenker RE, Eichner L, Vaidya H, Vaidya S, Oldham WG. Proc. Soc. Photo-Opt. Instrum. Eng. 1995; 2440: 118.
8. Fréchet JMJ, Ito H, Willson CG. Proc. Microcuit Eng. 1982; 260.
9. Ito H, Willson CG. Polym. Eng. Sci. 1983; 23: 1012.
10. Ito H, Willson CG. ACS Symp Ser. 1984; 242: 11-23.
11. Ito H, Willson CG, Fréchet JMJ. US Patent 4 491 628, 1985.
12. Crivello JV, Lam JH. J. Polym. Sci.: Polym Chem. Ed. 1979; 17: 977.
13. Crivello JV. J. Polym. Sci. A. 1999; 37: 4241.
14. MacDonald SA, Willson CG, Fréchet JMJ. Acc. Chem. Res. 1994; 27: 150.
15. Umbach CP, Broers AN, Willson CG, Koch R, Laibowitz RB. J. Vac. Sci. Technol. B 1988; 6: 319.
16. Umbach CP, Broers AN, Willson CG, Koch R, Laibowitz RB. IBM J. Res. Dev. 1988; 32: 454.
17. Zuniga M, Wallraff G, Tomacruz E, Smith B, Larson C, Hinsberg WD, Neureuther AR. J. Vac. Sci. Technol. B 1993; 11: 2862.
18. Postnikov SV, Stewart MD, Tran HV, Nierode MA, Medeiros DR, Cao T, Byers J, Webber SE, Willson CG. J. Vac. Sci. Technol. B 1999; 17: 3335.
19. Wallraff GM, Hinsberg WD, Houle FA, Morrison M, Larson CE, Sanchez M, Hoffnagle J, Brock PJ, Breyta G. Proc. Soc. Photo-Opt. Instrum. Eng. 1999; 3678: 138.
20. Croffie E, Cheng M, Neureuther A. J. Vac. Sci. Technol. B 1999; 17: 3339.
21. Fedenyshyn TH, Thackeray JW, Georger JH, Denison MD. J. Vac. Sci. Technol. B 1994; 12: 3888.
22. Nalamasu O, Reichmanis E, Hanson JE, Kanga RS, Heimbrook LA, Enerson AB, Baiocchi FA, Vaidya S. Polym. Eng. Sci. 1992; 32: 1565.
23. MacDonald SA, Hinsberg WD, Wendt HR, Clecak NJ, Willson CG, Snyder CD. Chem. Mater. 1993; 5: 348.
24. Ito H, Breyta G, Hofer D, Sooriyakunaran R, Petrillo K, Seeger D. J. Photopolym. Sci. Technol. 1994; 7: 433.
25. Breyta G, Hofer DC, Ito H, Seeger D, Petrillo K, Moritz H, Fischer T. J. Photopolym. Sci. Technol. 1994; 7: 449.
26. Goken H, Esho S, Ohnishi Y. J. Electrochem. Soc. 1983; 130: 143.
27. Allen RD, Wallraff GM, Hinsberg WD, Conley WE, Kunz RR. J. Photopolym. Sci. Technol. 1993; 6: 575.
28. Kunz RR, Allen RD, Hinsberg WD, Wallraff GM. Proc. Soc. Photo-Opt. Instrum. Eng. 1993; 1925: 167.
29. Kaimoto Y, Nozaki K, Takechi S, Abe N. Proc. Soc. Photo-Opt. Instrum. Eng. 1992; 1672: 66.
30. Allen RD, Wallraff GM, Hofer DC, Kunz RR. IBM J. Res. Dev. 1997; 41: 95.
31. Nozaki K, Watanabe K, Yano E, Kotachi A, Takechi S, Hanyu E. J. Photopolym. Sci. Technol. 1996; 9: 509.
32. Iwasa S, Maeda K, Nakano K, Ohfuji T, Hasegawa E. J. Photopolym. Sci. Technol. 1996; 9: 447.
33. Shida N, Ushirogouchi T, Asakawa K, Nakase M. J. Photopolym. Sci. Technol. 1996; 9: 457.
34. Okoroanyanwu U, Shimokawa T, Medeiros D, Willson CG, Fréchet JMJ, Niu JQ, Byers J, Allen RD. Proc. Soc. Photo-Opt. Instrum. Eng. 1997; 3049: 92.
35. Okoroanyanwu U, Shimokawa T, Byers J, Willson CG. Chem. Mater. 1998; 10: 3319.
36. Patterson K, Okoroanyanwu U, Shimokawa T, Cho S, Byers J, Willson CG. Proc. Soc. Photo-Opt. Instrum. Eng. 1998; 3333: 425.
37. Houlihan FM, Wallow TI, Nalamasu O, Reichmanis E. Macromolecules 1997; 30: 6517.
38. Byers J, Patterson K, Cho S, McCallum M, Willson CG. J. Photopolym. Sci. Technol. 1998; 11: 465.
39. Yamachika M, Patterson K, Cho S, Rager T, Yamada S, Byers J, Paniez PJ, Mortini B, Gaily S, Sassoulas P-O, Willson CG. J. Photopolym. Sci. Technol. 1999; 12: 553.
40. Semiconductor Industry Association Roadmap, 1999, http:// public.itrs.net/files/1999_SIA_Roadmap/Home.htm.
41. Palik ED, (ed). Handbook of Optical Constants of Solids. Academic Press: San Diego, 1991.
42. Kunz RR, Bloomstein TM, Hardy DE, Goodman RB, Downs DK, Curtin JE. Proc. Soc. Photo-Opt. Instrum. Eng. 1999; 3768: 13.
43. Grandler JR, Jencks WP. J. Am. Chem. Soc. 1982; 104: 1937.
44. Przybilla KJ, Roschert H, Pawlowski G. Proc. Soc. Photo-Opt. Instrum. Eng. 1992; 1672: 500.
45. Ito H, Seehof N, Nakayama T, Ueda M. ACS Symp. Ser. 1998; 706: Chapt. 16.
46. Patterson K, Somervell MH, Willson CG. Solid State Technol. 2000; 3: 43.
47. Patterson K, Yamachika M, Hung R, Brodsky C, Yamada S, Somervell M, Osborn B, Hall D, Dukovic G, Byers J, Conley W, Willson CG. Proc. Soc. Photo-Opt. Instrum. Eng. 2000; 3999: in press.
48. Vertommen J, Klippert W, Goethals AM, Van Roey F. J. Photopolym. Sci. Technol. 1998; 11: 597.
49. Kim HG, Kim MS, Bok CK, Park BJ, Kim JW, Baik KH, Lee DH. Proc. Soc. Phot-Opt. Instrum. Eng. 1998; 3333: 493.
50. Somervell MH, Fryer DS, Osborn B, Cho S, Patterson K, Byers JD, Willson CG. Proc. Soc. Phot-Opt. Instrum. Eng. 2000; 3999: in press.
51. Chou SY, Krauss P, Zhang W, Guo L, Zhuang L. J. Vac. Sci. Technol. B 1996; 15: 2897.
52. Ruchhoeft P, Colburn M, Choi B, Nounu H, Johnson S, Bailey T, Damle S, Stewart M, Ekerdt J, Sreenivasan SV, Wolfe JC, Willson CG. J. Vac. Sci. Technol. B 1999; 17: 2965.
53. Colburn M, Johnson S, Stewart M, Damle S, Jin B, Bailey T, Wedlake M, Michaelson T, Sreenivasan SV, Ekerdt J, Willson CG. Proc. Soc. Photo-Opt. Instrum. Eng. 1999; 3676: 379.