A novel polymer for a 193-nm resist

Journal of Photopolymer Science and Technology

Volumn 9, Issue 3, 1996, Pages 509-522

  Nozaki, Koji ^a   Watanabe, Keiji ^a   Yano, Ei ^a   Kotachi, Akiko ^a   Takechi, Satoshi ^a   Hanyu, Isamu ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000679152     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.509     Document Type: Article

References (13)

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