Towards the ultimate storage device: The fabrication of an ultra high density memory device with 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 295-304

  Cirelli, R A ^a   Bude, J ^a   Mansfield, W M ^a   Timp, G L ^a   Klemens, F P ^a   Watson, G P ^a   Weber, G R ^a   Sweeney, J R ^a   Houlihan, F ^a   Gabor, A ^a   Baumann, F ^a   Buonanno, M ^a   Forsyth, G F ^a   Barr, D ^a   Lee, T C ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTEGRATED CIRCUIT MANUFACTURE; PHOTORESISTS;

RESOLUTION ENHANCEMENT TECHNIQUES; ULTRAHIGH DENSITY MEMORY DEVICE;

NONVOLATILE STORAGE;

EID: 0006698679     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)