Optimization of 193 nm single layer resists through statistical design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 221-229

  Gabor, Allen H ^a   Dimov, Ognian ^a   Medina, Arturo N ^a   Neisser, Mark O ^a   Slater, Sydney G ^a   Wang, Ruey H ^a   Houlihan, Frank M ^a   Cirelli, Ray A ^a   Dabbagh, Gary ^a   Hutton, Richard S ^a   Rushkin, Ilya L ^a   Sweeney, James R ^a   Timko, Allen G ^a   Nalamasu, Om ^a   Reichmanis, Elsa ^a  

^a ARCH Chemicals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ETCHING; OPTICAL RESOLVING POWER; RESINS; THICK FILMS;

ETCH RESISTANCE;

PHOTORESISTS;

EID: 0032630554     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350205     Document Type: Conference Paper

References (12)