Novel organic resists for nanoscale imaging: From chemically amplified cycloaliphatic resists to dendrimer monolayers

Journal of Photopolymer Science and Technology

Volumn 12, Issue 3, 1999, Pages 405-416

  Pasini, D ^a   Niu, Q J ^a   Meagley, R P ^a   Tully, D C ^a   Trimble, A R ^a   Predict, J M J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

193 nm; Cyclopolymerization; Dendrimer; Etch resistance; Photoresists; Scanning probe lithography

Indexed keywords

EID: 0000816490     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.405     Document Type: Article

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