Alicyclic Polymers for 193 nm Resist Applications: Lithographic Evaluation

Chemistry of Materials

Volumn 10, Issue 11, 1998, Pages 3328-3333

  Okoroanyanwu, Uzodinma ^a,c   Byers, Jeffrey ^b   Shimokawa, Tsutomu ^a,d   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SEMATECH   (United States)

^c ADVANCED MICRO DEVICES   (United States)

^d Japan Synthetic Rubber Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006887289     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm970505x     Document Type: Article

References (20)

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