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Angewandte Chemie - International Edition

Volumn 37, Issue 5, 1998, Pages 667-670

Polymers for 193-nm microlithography: Regioregular 2-alkoxycarbonylnortricyclene polymers by controlled cyclopolymerization of bulky ester derivatives of norbornadiene

(2) Niu, Q Jason a Fréchet, Jean M J a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

Microlithography; Photoresists; Polymerizations

Indexed keywords

EID: 0344906082 PISSN: 14337851 EISSN: None Source Type: Journal
DOI: 10.1002/(SICI)1521-3773(19980316)37:5<667::AID-ANIE667>3.0.CO;2-H Document Type: Article

Times cited : (50)

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