Role of plasma-aided manufacturing in semiconductor fabrication

IEEE Transactions on Plasma Science

Volumn 26, Issue 6, 1998, Pages 1610-1620

  Hershkowitz, Noah ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA APPLICATIONS; PLASMA THEORY;

PLASMA PHYSICS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032314054     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.747878     Document Type: Article

References (86)

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