Ion energy and angular distributions in inductively coupled radio frequency discharges in argon

Journal of Applied Physics

Volumn 80, Issue 3, 1996, Pages 1304-1311

  Woodworth, Joseph R ^a   Riley, Merle E ^a   Meister, Dorothy C ^a   Aragon, Ben P ^a   Le, Minh S ^b   Sawin, Herbert H ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; ARGON; CALCULATIONS; DETECTORS; ELECTRON DENSITY MEASUREMENT; OSCILLATIONS; PLASMA DENSITY; PLASMA SHEATHS; PLASMAS; PRESSURE EFFECTS; TEMPERATURE DISTRIBUTION;

FARADAY SHIELD; GRIDDED ENERGY ANALYZER; INDUCTIVELY COUPLED PLASMAS; ION ANGULAR DISTRIBUTIONS; ION DETECTORS; ION ENERGY; RADIO FREQUENCY POWERS;

IONS;

EID: 0030213902     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362977     Document Type: Article

References (44)

1. A. J. vanRoosmalen, J. A. G. Baggerman, and S. J. H. Brader, Dry Etching/or VLSI (Plenum, New York, 1991).
2. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
3. S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era: Volume I-Process Technology (Lattice, Sunset Beach, CA, 1987).
4. J. E. Johannes, T. J. Bartel, R. S. Wise, and D. J. Economou, 42nd National Symposium of the American Vacuum Society, Minneapolis MN, 16 October 1995 (unpublished), paper PS-MoM7.
5. R. J. Hoekstra and M. J. Kushner, J. Appl. Phys. (in press).
6. C. Lee and M. A. Lieberman, J. Vac. Sci. Technol. A 13, 368 (1995).
7. E. F. Jaeger, L. A. Berry, J. S. Tolliver, and D. B. Batchelor, Phys. Plasmas 2, 2597 (1995).
8. E. Meeks and J. W. Shon, J. Vac. Sci. Technol. A 13, 2884 (1995).
9. B. Lipschultz, I. Hutchenson, B. LaBombard, and A. Wan, J. Vac. Sci. Technol. A 4, 1810 (1986).
10. I. H. Hutchenson, Principles of Plasma Diagnostics (Cambridge University Press, New York, 1992), p. 80.
11. J. A. Simpson, Rev. Sci. Instrum. 32, 1283 (1961).
12. J. Liu, G. L. Huppert, and H. H. Sawin, J. Appl. Phys. 68, 3916 (1990).
13. J. Liu, Ph.D. thesis, MIT, 1993. Available from MIT Document Services, Room 14-0551, 77 Mass Ave Cambridge, MA 02139-4307.
14. B. E. Thompson, K. D. Allen, A. D. Richards, and H. H. Sawin, J. Appl. Phys. 59, 1890 (1986).
15. U. Flender and K. Wiesemann, J. Phys. D: Appl. Phys. 27, 509 (1994).
16. A. Wild and P. Koidl, J. Appl. Phys. 69, 2909 (1991).
17. S. G. Ingram and N. St. J Braithwaite, J. Phys. D: Appl. Phys. 21, 1496 (1988).
18. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, J. Appl. Phys. 76, 2041 (1994).
19. S. M. L. Prokopenko, J. G. Laframboisie, and J. M. Goodings, J. Phys. D: Appl. Phys. 7, 355 (1974).
20. J. Hopwood, Appl. Phys. Lett. 62, 940 (1993).
21. U. Kortshagen and M. Zethoff, Plasma Sources Sci. Technol. 4 541 (1995).
22. G. Gibson, Jr., Ph.D. thesis, MIT, 1994.
23. M. S. Le, B. S. thesis, MIT, 1995.
24. F. Matthews, J. Phys. D: Appl. Phys. 17, 2243 (1984).
25. A. W. Molvik, Rev. Sci. Instrum. 52, 704 (1981).
26. J. Trow, Applied Materials, 47th Annual Gaseous Electronics Conference, Gaithersburg, MD, October 1994 (unpublished).
27. W. D. Davis and T. A. Vanderslice, Phys. Rev. 131, 219 (1963).
28. A. Manenschijn, E. van der Drift, G. C. A. M. Janssen, and S. Radelaar, J. Appl. Phys. 69, 7996 (1992).
29. W. M. Greene, M. A. Hartney, W. G. Oldham, and D. W. Hess, J. Appl. Phys. 63, 1367 (1988).
30. J. K. Olthoff, R. J. VanBrunt, and S. B. Radovanov, J. Appl. Phys. 72, 4566 (1992).
31. J. K. Olthoff, R. J. VanBrunt, and S. B. Radovanov, J. Res. Natl. Inst. Stand. Technol. 100, 383 (1995).
32. P. J. Hargis, Jr., K. E. Greenberg, P. A. Miller, J. B. Gerardo, J. R. Torczynski, M. E. Riley, G. A. Hebner, J. R. Roberts, J. K. Olthoff, J. R. Whetstone, R. J. Van Brunt, M. A. Sobolewski, H. M. Anderson, M. P. Splichal, J. L. Mock, P. Bletzinger, A. Garscadden, R. A. Gottscho, G. Selwyn, M. Dalvie, J. E. Heidenreich, J. W. Butterbaugh, M. L. Brake, M. L. Passow, J. Pender, A. Lujan, M. E. Elta, D. B. Graves, H. H. Sawin, M. J. Kushner, J. T. Verdeyen, R. Horwath, and T. R. Turner, Rev. Sci. Instrum. 65, 140 (1994).
33. J. K. Olthoff and K. E. Greenberg, J. Res. Natl. Inst. Stand. Technol. 100, 327 (1995).
34. P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
35. The wire screen grids for the isolated detector were obtained from the Unique Wire Weaving Co, Inc., 762 Ramsey Ave., Hillside, NJ 07025.
36. P. A. Taylor, J. Vac. Sci. Technol. A 6, 2583 (1988).
37. VESPEL™ is a trademark of the DuPont Corporation.
38. Pinholes were obtained from National Apertures, Inc. 26 Keewaydin Dr., Suite B, Salem, NH.
39. Screen grids for the mini-ion detector were of electroformed nickel and were obtained from Buckbee-Mears, Inc., 254 E. 6th St, St. Paul, MN 55101.
40. E. W. McDaniel, Collision Phenomena in Ionized Gases (Wiley, New York, 1964), pp. 165 and 464.
41. J. A. Hornbeck, Phys. Rev. 84, 615 (1951).
42. G. A. Hebner, J. Appl. Phys. (to be published).
43. K. U. Riemann, Phys. Fluids 24, 2163 (1981).
44. F. F. Chen, Introduction to Plasma Physics and Controlled Fusion, 2nd ed. (Plenum New York, 1983), p. 231.