Role of nitrogen in the downstream etching of silicon nitride

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2151-2157

  Blain, M G ^a   Meisenheimer, T L ^a   Stevens, J E ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030489576     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580039     Document Type: Article

References (9)

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