Essential points for precise etching processes in pulse-time-modulated ultrahigh-frequency plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 643-646

  Samukawa, Seiji ^a   Tsukada, Tsutomu ^b  

^a NEC CORPORATION   (Japan)

^b Anelva Company Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043110226     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580698     Document Type: Article

References (7)

1. N. Fujiwara, T. Maruyama, M. Yoneda, and K. Tsukamoto, in Proceedings of the 15th DryProcess Symposium (The Institute of Electrical Engineering of Japan, Tokyo, 1993), p. 45.
2. H. Ohtake and S. Samukawa, in Proceedings of 17th Dry Process Symposium (The Institute of Electrical Engineering of Japan, Tokyo, 1995), p. 45.
3. S. Samukawa, Jpn. J. Appl. Phys. 33, 2133 (1994).
4. S. Samukawa and K. Terada, J. Vac. Sci. Technol. B 12, 3300 (1994).
5. T. H. Ahn, K. Nakamura, and H. Sugai, Jpn. J. Appl. Phys. 34, L1405 (1995).
6. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyama, and K. Shinohara, Jpn. J. Appl. Phys. 34, 6805 (1995).
7. S. Samukawa, Appl. Phys. Lett. 68, 316 (1996).